TEPLA 300 PLASMA ASHER consisting of:

- Model: 300 SemiAuto
- Manual Wafer Load Plasma Asher
- Used for Wafer Cleaning and Descum
- Can Process up to 150mm Wafers
- Faraday Cage
- Computer PC Controlled
- Plasma Chamber: Quartz
- Plasma Chamber Dims: 245mm Diameter, 380mm Depth
- Plasma Generation: 2.45 GHz Max / 1,000 Watt Variable
- Gas Lines: N2 Gas Input and 2 Process Gas Inputs
- All MFCs Rebuilt and Calibrated
- Vacuum Pump (Professionally Rebuilt)
- Operators Manual for Tepla 300
- System Refurbishment Includes: All Consumables (O-Rings, Seals) Replaced, MFCs Rebuilt and Calibrated, Quartz Chamber Cleaned, Vacuum Pump Rebuilt, and more.
- Excellent Condition Guaranteed!

SPTS OMEGA fxP RAPIER DEEP SILICON ETCH SYSTEM Consisting of:

- Model: Omega fxP Plasma Etch System
- fxP Wafer Transport Module
- One DSi Rapier Process Module
- This is a multi-chamber system and more chambers can be added
- Capable of up to 200mm wafers
- Vintage: 2011

Standard System Features:
- 4-color Alarm Tower
- Windows based control software
- Bracket-mounted high resolution colour TFT monitor with keyboard
- Thru Wall panel
- PC104 control architecture
- Devicenet control of module pendulum valve, MFCs, pneumatics, fore-line Convectron, thermocouples
- 10 m free cable to electronics rack
- Electronics cabinet
- CE compliant
- SEMI –S2 compliant
- Two sets of system manuals on CD
- Rear control station

fxP Transport Module:
- 8 port wafer transport module
- Brooks MagnaTran 7 series robot
- Two fixed vacuum cassettes
- Dynamic Wafer Aligner
- Windows based control software

DSi Rapier Process Module
- Bosch process deep Si module
- Rapier Plasma Source
- Module envelope contains all process control hardware
- PC104 control unit
- AE Apex RF generator (Primary source)
- AE Apex RF generator (Secondary source)
- AE Apex RF generator (bias) – HF
- AE Apex RF generator (bias) - LF
- RF Bias match
- Top power fixed match
- DC coil supply
- Heated VAT pendulum valve
- Electro-static chuck, PSU & He back-pressure control
- Heated lower chamber, DSi upper chamber & foreline
- Extracted surface mount gas boxes (1x Primary, 1 x Secondary)
- Alcatel ATH2300MT turbo pump
- Automated He flow endpoint
- Turbo by-pass for module roughing
- Chamber capacitance manometer (1.0 torr)
- Foreline mini-capacitance manometer
- Wafer edge protection ring
- Perfluoroelastomer seals

Option Included:
- Claritas Optical Endpoint System

Ancillary Equipment:
1. Re-circulating chiller (Bettatech CU700) – Chills platen
2. ADIXEN ADP122LM
3. ADIXEN ADS602H
4. Delatech Exhaust Gas Scrubber
5. Thermo Flex 24000 Neslab Chiller – Chills pumps and tool

PLASMATHERM SLR-720 ICP consisting of:

- Model: SLR-720
- ICP (Inductively Coupled Plasma)
- Single chamber with load lock
- Currently set to run 4"/100mm Wafers
- Can process up to 8"/200mm wafers
- 10" Electrode
- Chlorine Etch Chemistries
- Leybold Turbo Pump
- Dual RF
- RFPP RF5S 500W RF Generator
- Advanced Energy RF-20MWC 2000W 2MHz RF Generator
- 2 Vacuum Pumps
- Chiller
- Power Box
- Process Software
- MKS MFC''s (Qty 7 installed)
- Set of Operation Manuals
- Gas Configuration (8 MFCs):
Line 1 – 100cc BCl3 with bypass
Line 2 – 100cc HBr with bypass
Line 3 – 100cc Ar, no bypass
Line 4 – 200cc O2 no bypass
Line 5 – 100cc SF6 no bypass
Line 6 – currently unused
Line 7 – 100cc Cl2 no bypass


REFURBISHED TO MEET EXCELLENT CONDITION consisting of:

- Chamber disassembled for refurbishment.
- Chamber received full wet clean.
- Chamber o-rings and seals are replaced with brand new.
- Electrostatic Chuck (ESC) sent out for refurbishment (if applicable)
- All MFCs rebuilt and calibrated professionally.
- All corrosive gas lines replaced with brand new.
- All Non-corrosive gas lines cleaned.
- Vacuum pumps professionally rebuilt.
- Turbo pump professionally rebuilt.
- Chillers serviced and fully tested.
- All wiring/wire harnesses are checked, repaired or replaced if needed.
- All liquid and air lines, tubing and fittings checked and replaced if necessary.
- Major components disassembled for checkout, servicing, cleaning, and lubricating. Parts are repaired or replaced as needed.
- Checkout of all electronic and mechanical parts.
- Machine covers are cleaned, polished or replaced as needed.
- Equipment is fully tested to verify compliance to specifications.
- Post-refurbishment system leak and RF calibration checks, with documentation provided to customer.
- System cycle and repeatability testing completed prior to cover replacement and wipe down.
- System components carefully packed, labeled, and professionally crated.

PLASMATHERM SLR-720 ICP consisting of:

- Model: SLR-720
- ICP (Inductively Coupled Plasma)
- Single chamber with load lock
- Currently set to run 4"/100mm Wafers
- Can process up to 8"/200mm wafers
- 10" Electrode
- Chlorine Etch Chemistries
- Leybold Turbo Pump
- Dual RF
- RFPP RF5S 500W RF Generator
- Advanced Energy RF-20MWC 2000W 2MHz RF Generator
- 2 Vacuum Pumps
- Chiller
- Power Box
- Process Software
- MKS MFC''s (Qty 7 installed)
- Set of Operation Manuals
- Gas Configuration (8 MFCs):
Line 1 – 100cc BCl3 with bypass
Line 2 – 100cc HBr with bypass
Line 3 – 100cc Ar, no bypass
Line 4 – 200cc O2 no bypass
Line 5 – 100cc SF6 no bypass
Line 6 – currently unused
Line 7 – 100cc Cl2 no bypass


REFURBISHED TO MEET EXCELLENT CONDITION consisting of:

- Chamber disassembled for refurbishment.
- Chamber received full wet clean.
- Chamber o-rings and seals are replaced with brand new.
- Electrostatic Chuck (ESC) sent out for refurbishment (if applicable)
- All MFCs rebuilt and calibrated professionally.
- All corrosive gas lines replaced with brand new.
- All Non-corrosive gas lines cleaned.
- Vacuum pumps professionally rebuilt.
- Turbo pump professionally rebuilt.
- Chillers serviced and fully tested.
- All wiring/wire harnesses are checked, repaired or replaced if needed.
- All liquid and air lines, tubing and fittings checked and replaced if necessary.
- Major components disassembled for checkout, servicing, cleaning, and lubricating. Parts are repaired or replaced as needed.
- Checkout of all electronic and mechanical parts.
- Machine covers are cleaned, polished or replaced as needed.
- Equipment is fully tested to verify compliance to specifications.
- Post-refurbishment system leak and RF calibration checks, with documentation provided to customer.
- System cycle and repeatability testing completed prior to cover replacement and wipe down.
- System components carefully packed, labeled, and professionally crated.

PLASMATHERM 790 PECVD SYSTEM consisting of:

- Model: 790
- PECVD Chamber with 8" Platen
- To be set up for 8"/200mm wafers
- Manual Wafer Load Chamber (Non-Load Lock)
- RFPP Model RF5S generator ( 13.56 MHZ, 500 Watt ) or equivalent
- Substrate Heat
- System Computer, Keyboard and Mouse
- Brand New LCD Monitor
- Edwards QDP80 Vacuum Pump with Blower (Professionally Rebuilt) or equivalent
- System Chiller
- Watlow Series 988 Controller
- Emergency Shut Off Button (EMO)
- Electrical Power Box
- System Power: 208V, 3PH, 60Amp, 50/60Hz
- Operations Manual
- Refurbished to Meet Original Plasmatherm 790 specs

Gas Configuration:
SiH4
N2O
O2
NH3
N2
C2F6

ClassOne Support Worldwide of Plasmatherm Etchers:

- ClassOne Supports all our Used and Refurbished Plasmatherm PECVD Systems with Spare Parts and Service Worldwide
- Installation & Training available Worldwide

SPTS MULTIPLEX ASE-HRM ICP PRO ETCHER consisting of:

Configuration:
- Model: Multiplex ICP PRO
- Process Chamber: ASE-HRM
- ASE-HRM chamber: High Rate Magnetic source achieves over three times the etch rates versus the original Bosch process
- Process: High Rate Deep Silicon Etch
- Operating software: Windows
- Max wafer size capable: 200mm
- Voltage: 208V 60Hz 3Ph

Vacuum Load-lock For Single Chamber Multiplex systems (MESC):
- Carousel Load Lock (200mm)
- Chamber lid temperature control
- Fully automatic transfer of substrates between the load-lock and the process chamber

Multiplex ICP Process Chamber:
- Production proven single wafer process chamber
- Balun Coil for High Rate Etch
- Turbo Pump
- VAT Pendulum Valve
- Backside Helium Cooling
- Remote sealed extracted gas box with orbitally welded gas lines
- Electronics cabinet
- LCD flat panel monitor
- Fully automatic multistep processing or manual operation
- High Frequency RF Generator
- Low Frequency RF Generator
- Vacuum Pump (Load Lock)
- Vacuum Pump (Chamber)
- Chiller
- System Cables (full set)

- Operations Manuals
- Refurbished to excellent condition by SPTS factory trained technicians.

OXFORD PLASMALAB 80 PLUS RIE ETCHER consisting of:

- Model: Plasmalab 80 Plus RIE
- Single Chamber RIE, non-load locked
- Ideal for R&D reactive ion etch applications
- Platen: 200mm diameter
- Windows 7 PC ($25,000 upgrade included)
- Upgraded PLC with latest Software
- 300W Advanced Energy Hilight 133 RF Generator
- Edwards QDP80 Vacuum Pump & 250 Blower (professionally rebuilt)
- System Chiller (professionally rebuilt)
- System Dimensions: 23"x40"x59" (LxWxH)
- Operations Manual and Documentation
- Fully Refurbished to excellent condition (see below details)


GAS CONFIGURATION:
Gas 1:
Gas 2:
Gas 3:
Additional 3 gases (up to 6 total) can be added at later date at cost.


REFURBISHMENT PROCESS FOR OXFORD PLASMALAB 80 PLUS RIE consisting of:

- Chamber disassembled for refurbishment.
- Chamber received full wet clean.
- Chamber o-rings and seals are replaced with brand new.
- All MFCs rebuilt and calibrated professionally.
- All corrosive gas lines replaced with brand new.
- All Non-corrosive gas lines cleaned.
- Vacuum pumps professionally rebuilt.
- Turbo pump professionally rebuilt.
- Chillers serviced and fully tested.
- All wiring/wire harnesses are checked, repaired or replaced if needed.
- All liquid and air lines, tubing and fittings checked and replaced if necessary.
- Major components disassembled for checkout, servicing, cleaning, and lubricating. Parts are repaired or replaced as needed.
- Checkout of all electronic and mechanical parts.
- Machine covers are cleaned, polished or replaced as needed.
- Equipment is fully tested to verify compliance to specifications.
- Post-refurbishment system leak and RF calibration checks, with documentation provided to customer.
- System cycle and repeatability testing completed prior to cover replacement and wipe down.

OXFORD PLASMALAB 80 PLUS PECVD consisting of:

- Model: Plasmalab 80 Plus
- Single PECVD chamber, non load-locked
- Windows 7 PC ($25,000 upgrade included)
- Upgraded PLC with latest Software
- Vacuum Pump
- Chiller
- Operations Manual and Documentation

GAS CONFIGURATION :

- N2
- O2
- CF4
- Ar

YIELD ENGINEERING YES-III VAPOR PRIME OVEN consisting of:

- Model: YES-III -LP3
- HMDS Vapor Prime and Vacuum Bake Oven Fully Refurbished
- Chamber Dimensions Approximately 16" x 16" x 16"
- Built-in Chamber Shelf
- 6 Heater
- Temperature Controller
- HMDS Cylinder
- Convectron Gauge
- Vacuum Pump (professionally rebuilt)
- Power: 120V, 14A, 1600 Watts, 60 Hz
- Operating Manuals and Documentation

SPTS PRIMAXX MONARCH 3 HF VAPOR ETCHER consisting of:


- Model: Primaxx Monarch 3
- Process: HF Vapor Etcher
- For Anhydrous HF Gas Etching of Oxide
- Currently Configured for 6”/150mm Wafers
- Capable of processing up to 8”/200mm Wafers
- Semi-Automatic 3-Wafer Loader with Load Lock
- Single Process Chamber
- Integrated Panel PC with on-board electronics minimizes cleanroom footprint
- Third generation Primaxx process chamber has been designed for easy wafer size
changed and maintenance
- Vacuum Pumps (as required)
- Primaxx Manuals & Documentation
- Vintage: 2010

Oxford Plasmalab 100 RIE System
- update configuration below and copy/paste here

TEPLA 300 AL PC PLASMA ASHER consisting of:

- Model: 300 AL PC
- Manual Wafer Load Plasma Asher
- Used for Wafer Cleaning and Descum
- Can Process up to 150mm Wafers
- Faraday Cage
- Computer PC Controlled
- Plasma Chamber: Quartz
- Plasma Chamber Dims: 245mm Diameter, 380mm Depth
- Plasma Generation: 2.45 GHz Max / 1,000 Watt Variable
- Gas Lines: N2 Gas Input and 2 Process Gas Inputs
- All MFCs Rebuilt and Calibrated
- Vacuum Pump (Professionally Rebuilt)
- Operators Manual for Tepla 300
- System Refurbishment Includes: All Consumables (O-Rings, Seals) Replaced, MFCs Rebuilt and Calibrated, Quartz Chamber Cleaned, Vacuum Pump Rebuilt, and more.
- Excellent Condition Guaranteed!

TEPLA 300 AL PC PLASMA ASHER consisting of:

- Model: 300 AL PC
- Manual Wafer Load Plasma Asher
- Used for Wafer Cleaning and Descum
- Can Process up to 150mm Wafers
- Faraday Cage
- Computer PC Controlled
- Plasma Chamber: Quartz
- Plasma Chamber Dims: 245mm Diameter, 380mm Depth
- Plasma Generation: 2.45 GHz Max / 1,000 Watt Variable
- Gas Lines: N2 Gas Input and 2 Process Gas Inputs
- All MFCs Rebuilt and Calibrated
- Vacuum Pump (Professionally Rebuilt)
- Operators Manual for Tepla 300
- System Refurbishment Includes: All Consumables (O-Rings, Seals) Replaced, MFCs Rebuilt and Calibrated, Quartz Chamber Cleaned, Vacuum Pump Rebuilt, and more.
- Excellent Condition Guaranteed!

TEPLA 300 AL PC PLASMA ASHER consisting of:

- Model: 300 AL PC
- Manual Wafer Load Plasma Asher
- Used for Wafer Cleaning and Descum
- Can Process up to 150mm Wafers
- Faraday Cage
- Computer PC Controlled
- Plasma Chamber: Quartz
- Plasma Chamber Dims: 245mm Diameter, 380mm Depth
- Plasma Generation: 2.45 GHz Max / 1,000 Watt Variable
- Gas Lines: N2 Gas Input and 2 Process Gas Inputs
- All MFCs Rebuilt and Calibrated
- Vacuum Pump (Professionally Rebuilt)
- Operators Manual for Tepla 300
- System Refurbishment Includes: All Consumables (O-Rings, Seals) Replaced, MFCs Rebuilt and Calibrated, Quartz Chamber Cleaned, Vacuum Pump Rebuilt, and more.
- Excellent Condition Guaranteed!

PLASMATHERM 790 RIE ETCHER consisting of:

- Model: 790 RIE
- RIE Chamber
- Capable of Processing up to 8"/200mm Wafers
- Manual Wafer Load Chamber (Non-Load Lock)
- Turbo Pump and Controller
- Four Channel Gas Box (may be upgraded up to 8 channel.)
- Brand New LCD Monitor
- Chiller
- System Vacuum Pump
- EMO Button
- System Power: 208V, 60Hz
- Operations Manual
- Refurbished to Excellent Condition
- Available for Full Inspection and Demonstration at ClassOne!


ClassOne Support Worldwide of Plasmatherm RIE Etchers:

- ClassOne Supports all our Used and Refurbished Plasmatherms with Spare Parts and Service Worldwide
- Installation & Training available Worldwide
- Our Refurbishment Process: http://www.classoneequipment.com/content/etching-systems

OXFORD PLASMALAB 80 PLUS ICP ETCHER consisting of:

- Model: Plasmalab 80 Plus RIE/ICP
- Single Chamber, non-load locked
- Platen: 200mm diameter
- New Windows 10 Operating Software ($25,000 upgrade included)
- New PLC with latest Oxford Software
- 300W Advanced Energy Hilight 133 RF Generator
- Edwards QDP80 Vacuum Pump & 250 Blower (professionally rebuilt)
- System Chiller (professionally rebuilt)
- System Dimensions: 23"x40"x59" (LxWxH)
- Operations Manual and Documentation
- Fully Refurbished to excellent condition (see below details)


GAS CONFIGURATION:
Gas 1:
Gas 2:
Gas 3:
Additional 3 gases (up to 6 total) can be added at later date at cost.


REFURBISHMENT PROCESS FOR OXFORD PLASMALAB 80 consisting of:

- Chamber disassembled for refurbishment.
- Chamber received full wet clean.
- Chamber o-rings and seals are replaced with brand new.
- All MFCs rebuilt and calibrated professionally.
- All corrosive gas lines replaced with brand new.
- All Non-corrosive gas lines cleaned.
- Vacuum pumps professionally rebuilt.
- Turbo pump professionally rebuilt.
- Chillers serviced and fully tested.
- All wiring/wire harnesses are checked, repaired or replaced if needed.
- All liquid and air lines, tubing and fittings checked and replaced if necessary.
- Major components disassembled for checkout, servicing, cleaning, and lubricating. Parts are repaired or replaced as needed.
- Checkout of all electronic and mechanical parts.
- Machine covers are cleaned, polished or replaced as needed.
- Equipment is fully tested to verify compliance to specifications.
- Post-refurbishment system leak and RF calibration checks, with documentation provided to customer.
- System cycle and repeatability testing completed prior to cover replacement and wipe down.

ALCATEL 601HPE RIE (REACTIVE ION ETCHER) consisting of:

- Model 601HPE Deep Reactive Ion Etcher
- Currently set up for 6" wafers
- RFPP RF5S RF Generator
- Load Lock Turbo Pump
- Vacuum Pump & Chiller
- Pump
- Chiller

Current Gas Configuration:
- CF4
- O2
- HE
- C2F6
- CHF3

ALCATEL 601E DRIE (DEEP REACTIVE ION ETCHER) consisting of:

- Model 601E Deep Reactive Ion Etcher
- Currently set up for 6" wafers
- Mechanical Clamp
- Backside He Cooling
- RFPP RF20S RF Generator
- RFPP LF-5 RF Generator
- Alcatel Adixen Turbo Pump
- Vacuum Pump & Chiller
- Pump
- Chiller

Current Gas Configuration:
- SF6
- C4F8
- CHF3
- O2
- AR
- N2

TEPLA 300 AL PC PLASMA ASHER consisting of:

- Model: 300 AL PC
- Manual Wafer Load Plasma Asher
- Used for Wafer Cleaning and Descum
- Can Process up to 150mm Wafers
- Faraday Cage
- Computer PC Controlled
- Plasma Chamber: Quartz
- Plasma Chamber Dims: 245mm Diameter, 380mm Depth
- Plasma Generation: 2.45 GHz Max / 1,000 Watt Variable
- Gas Lines: N2 Gas Input and 2 Process Gas Inputs
- All MFCs Rebuilt and Calibrated
- Vacuum Pump (Professionally Rebuilt)
- Operators Manual for Tepla 300
- System Refurbishment Includes: All Consumables (O-Rings, Seals) Replaced, MFCs Rebuilt and Calibrated, Quartz Chamber Cleaned, Vacuum Pump Rebuilt, and more.
- Excellent Condition Guaranteed!

SPTS MPX ICP ETCHER consisting of:

- Model: MPX PRO ICP
- Previously used for SiC (Silicon Carbide) Etch Process
- Single process chamber with manually loaded vacuum loadlock, with carousel wafer handler 2 wafers
- Inductively Coupled Plasma Source (ICP)
- Currently Configured for 4"/100mm Wafers
- Capable of processing up to 8"/200mm wafers
- Carousel Load Lock (2-Wafer Carousel)
- Heated Lower Chamber
- Load-Lock Chamber
- Helium Substrate Backside Cooling
- Weighted Clamp
- Edwards IH80 Vacuum Pump (Chamber)
- Alcatel Adixen ACG 28G Vacuum Pump (Load Lock)
- SMC Thermo Chiller
- Electronics Rack
- MKS Spectrum 1.5KW 13.56MHz RF Generator (Source)
- ENI ACG3B 13.56MHz RF Generator (Lower Electrode)
- Leybold MAG 1500 CT Turbo Pump
- System Cables (full set)
- SPTS PRO System Software
- Verity Instruments SD1024F Smart Spectrograph EPD
- User Manuals & Documentation
- All Passwords Needed to Operate the System
- Year of Manufacture: 2011
- Serial Number: MPO691


On Board Gas Box with following Gas Configuration:
- O2 @ 100 SCCM
- C4F8 @ 200 SCCM
- SF6 @ 200
- Ar @ 200 SCCM
- He @ 200 SCCM
- CF4 @ 200 SCCM
- CHF3 @ 100 SCCM
- NF3 @ 200 SCCM

FULLY REFURBISHED:

- Chamber disassembled for refurbishment.
- Chamber received full wet clean.
- Chamber o-rings and seals are replaced with brand new.
- Electrostatic Chuck (ESC) sent out for refurbishment (if applicable)
- All MFCs rebuilt and calibrated professionally.
- All corrosive gas lines replaced with brand new.
- All Non-corrosive gas lines purged.
- Vacuum pumps professionally rebuilt.
- Turbo pump professionally rebuilt.
- Chillers serviced and fully tested.
- All wiring/wire harnesses are checked, repaired or replaced if needed.
- All liquid and air lines, tubing and fittings checked and replaced if necessary.
- Major components disassembled for checkout, servicing, cleaning, and lubricating. Parts are repaired or replaced as needed.
- Checkout of all electronic and mechanical parts.
- Machine covers are cleaned, polished or replaced as needed.
- Post-refurbishment system leak and RF calibration checks, with documentation provided to customer.
- System cycle and repeatability testing completed prior to cover replacement and wipe down.
- A software license may be obtained directly from SPTS
- SPTS does not certify any third party equipment refurbishments
- System components carefully packed, labeled, and professionally crated.